Summary
The use of GaN manufacturing technology is very effective and efficient for high-frequency transistor devices. The technology is advancing and the use of GaN in the RF/microwave industry is growing quickly. The availability of accurate models with advanced simulation features is very important to designers. Electronic design allows for cost-effective design optimization, but accurate models are a necessity to successful simulation.
Acknowledgements and Additional Information
This article expands upon a presentation delivered at the 2016 EDI CON conference held in September 2016 in Boston. The authors would like to thank Qorvo for collaboration related to this work as part of the Modelithics Vendor Partner (MVP) program, as well as Keysight Technologies and Maury Microwave for measurement solution collaboration.
A trial of the Modelithics Qorvo GaN Library for Keysight ADS and/or NI AWR Design Environment is available to approved designers and can be requested here.
For designer convenience, an extensive collection of documentation and example workspaces related to the Modelithics Qorvo GaN device models is available.
Larry Dunleavy, Jiang Liu, Miriam Calvo, Hugo Morales, and Laura Levesque
Modelithics
Raj Santhakumar
Qorvo
References
1. “Non-Linear and Noise Modeling of a 0.15um GaN Die Family,” presentation at EDI CON 2016.
2. “GaN: The Industry’s Hot Technology,” 2017.
3. Nayak, M-Y. Kao, H-T Chen, T. Smith, P. Goeller, W. Gao, J. Jimenez, S. Chen, C. Campbell, G. Drandova, R. Kraft, “0.15um GaN MMIC manufacturing technology for 2-50 GHz power applications,” 2015 International conference on compound semiconductor manufacturing technology, Scottsdale, Ariz.
4. Dunleavy, H. Morales, C. Suckling, and Kim Tran, “Device and PA Circuit Level Validations of a High Power GaN Model Library,” Microwave Journal, August 2016.